| Name: | PLASMA CHEMISTRY AND PLASMA PROCESSING |
| ISSN: | 1572-8986 |
| PISSN: | 0272-4324 |
| Publisher: | SPRINGER |
| Area: | Engineering, Chemical | Physics, Applied | Physics, Fluids & Plasmas |
| Website: | https://link.springer.com/search?facet-content-type=Journal&query=1572-8986 |
| About: | ONE NEW YORK PLAZA, SUITE 4600 , NEW YORK, United States, NY, 10004. Paper Language: English open access:NO |
| Rating: | ABCD Index for this Journal is "A" |
| Status: |